A new silicon quantum-well structure with controlled diameter and thickness fabricated with ferritin iron core mask and chlorine neutral beam etching

Seiji Samukawa, Tomohiro Kubota, Chi Hsien Huang, Takeshi Hashimoto, Makoto Igarashi, Kensuke Nishioka, Masaki Takeguchi, Yukiharu Uraoka, Takashi Fuyuki, Ichiro Yamashita

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Engineering & Materials Science

Physics & Astronomy