A new silicon quantum-well structure with controlled diameter and thickness fabricated with ferritin iron core mask and chlorine neutral beam etching

Seiji Samukawa, Tomohiro Kubota, Chi Hsien Huang, Takeshi Hashimoto, Makoto Igarashi, Kensuke Nishioka, Masaki Takeguchi, Yukiharu Uraoka, Takashi Fuyuki, Ichiro Yamashita

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

A disk-shaped silicon nanostructure, which works as a quantum well, was fabricated by etching a polycrystalline siIicon/SiO2/silicon wafer with a chlorine neutral beam. The diameter (about 8 to 10 nm) and thickness (about 2 to 4 nm) of the nanodisk were controlled by changing the surface-oxide-removal conditions and deposition thickness of poly-silicon. Current-voltage measurements of the nanodisk showed staircase characteristics at room temperature (RT). The staircase width does not depend strongly on nanodisk diameter, but It strongly depends on nanodisk thickness. This result suggests that the nanodisk works as a quantum-well at RT.

Original languageEnglish
Pages (from-to)740021-740023
Number of pages3
JournalApplied Physics Express
Volume1
Issue number7
DOIs
Publication statusPublished - 2008 Jul

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'A new silicon quantum-well structure with controlled diameter and thickness fabricated with ferritin iron core mask and chlorine neutral beam etching'. Together they form a unique fingerprint.

Cite this