A new model of DLA under high magnetic field

Hiroshi Mizuseki, Kazumi Tanaka, Keiko Kikuchi, Kaoru Ohno, Yoshiyuki Kawazoe

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)


A new Monte Carlo model is introduced to describe diffusion-limited aggregation (DLA) with extra forces arising from Lorentz's and/or Coulomb forces. Furthermore, we simulate a behavior of multiparticle diffusive aggregation to examine the resultant pattern of crystal in electrochemical deposition. Different patterns grown under various external forces are produced by Monte Carlo simulations. In the present model, the basic movement of particles is a random walk, with different transition probabilities in different directions, which characterizes stochastically the effect of extra forces. In case of assuming a high magnetic field, pattern formations which are qualitatively different from the standard DLA model are observed and they are successfully compared with preexisting experiments (Mogi et al., 1991). The present numerical results of electrochemical deposition show that the generated patterns strongly depend on the force acting on ions and their concentration (Sawada et al., 1986).

Original languageEnglish
Pages (from-to)46-50
Number of pages5
JournalComputational Materials Science
Issue number1-4
Publication statusPublished - 1998 Feb


  • Crystal growth
  • Diffusion-limited aggregation (DLA)
  • Electrochemical deposition
  • Fractal dimension
  • Magnetic field
  • Monte Carlo method
  • Random walk

ASJC Scopus subject areas

  • Computer Science(all)
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Physics and Astronomy(all)
  • Computational Mathematics


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