A new fabrication technology of FinFETs using a neutral beam etching

Kazuhikp Endo, Shuichi Noda, Takuya Ozaki, Seiji Samukawa, Meishoku Masahata, Yongxun Liu, Kenichi Ishii, Hidenori Takashima, Etsuro Sugimata, Takashi Matsukawa, Yuki Yamauchi, Yuki Ishikawa, Eiichi Suzuki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science