A NEW APPROACH TO THE OBSERVATION OF THE RESIST IN X‐RAY CONTACT MICROSCOPY

Kunio Shinohara, Sadao Aoki, Mihiro Yanagihara, Akira Yagishita, Yasuo Iguchi, Akira Tanaka

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

X‐ray microscopy is one of the useful applications of synchrotron radiation researches, and at present, X‐ray contact microscopy is the best developed method in this field. The images on the resist in X‐ray contact microscopy have been observed with a scanning electron microscope, and there have been some attempts to use the transmission electron microscope, but few have used the replica method. We have applied the replica method with plasma polymerization‐film to observe X‐ray images on the resist with a transmission electron microscope and found it to be applicable. A long exposure time is required when we use the monochromatic synchrotron radiation with a grasshopper monochromator. Our preliminary experiments with a new light source, undulator radiation, showed that it is very intense and useful for X‐ray contact microscopy.

Original languageEnglish
Pages (from-to)401-403
Number of pages3
JournalPhotochemistry and Photobiology
Volume44
Issue number3
DOIs
Publication statusPublished - 1986 Jan 1

ASJC Scopus subject areas

  • Biochemistry
  • Physical and Theoretical Chemistry

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    Shinohara, K., Aoki, S., Yanagihara, M., Yagishita, A., Iguchi, Y., & Tanaka, A. (1986). A NEW APPROACH TO THE OBSERVATION OF THE RESIST IN X‐RAY CONTACT MICROSCOPY. Photochemistry and Photobiology, 44(3), 401-403. https://doi.org/10.1111/j.1751-1097.1986.tb04683.x