A Monte Carlo simulation on the process of cluster deposition

K. Hongo, H. Mizuseki, Y. Kawazoe

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

Cluster deposition process is expected to open a new scheme for thin-film formation process, which realizes better physico-chemical properties than by conventional processes. We simulate the variants of morphologies of thin films fabricated by the cluster deposition, since it is important to investigate the properties of the thin film. In this paper, a Monte Carlo method is applied to describe the motion of clusters and monomers. The present numerical simulation is performed on a three-dimensional lattice. Some growth morphologies are obtained, and the relationship between the resultant morphologies and the parameters used in the simulation such as deposition rate and size of the clusters are examined.

Original languageEnglish
Pages (from-to)439-442
Number of pages4
JournalMaterials Transactions
Volume42
Issue number3
DOIs
Publication statusPublished - 2001

Keywords

  • Cluster deposition
  • Computer simulation
  • Monte Carlo method
  • Segregation
  • Thin film

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint

Dive into the research topics of 'A Monte Carlo simulation on the process of cluster deposition'. Together they form a unique fingerprint.

Cite this