A microwave spectrometer to monitor discharge cleaning

Y. Funato; S. Kitajima; H. Watanabe; M. Mushiaki; Y. Kubota; A. Miyahara

doi:10.1016/0022-3115(87)90432-6

A microwave spectrometer to monitor discharge cleaning

Y. Funato, S. Kitajima, H. Watanabe, M. Mushiaki, Y. Kubota, A. Miyahara

ENG - Quantum Science and Energy Engineering

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

A new type of gas monitor using microwave spectroscopy is applied for studying glow discharge cleaning in a toroidal plasma device. The amount of H₂O partial pressure during the cleaning procedure is determined by the absoprtion of the microwave power with corresponding rotational spectra of 22.235 GHz for water molecules. By applying this method, it is possible to measure the relatively high gas pressure (up to 100 Pa) encountered during the cleaning. The rate of H₂O production and the time history of H₂O during the cleaning are monitored and the efficiency of the reduction of H₂O is discussed.

Original language	English
Pages (from-to)	720-722
Number of pages	3
Journal	Journal of Nuclear Materials
Volume	145-147
Issue number	C
DOIs	https://doi.org/10.1016/0022-3115(87)90432-6
Publication status	Published - 1987 Feb 2

Keywords

HO monitor
discharge cleaning
microwave spectroscopy

ASJC Scopus subject areas

Nuclear and High Energy Physics
Materials Science(all)
Nuclear Energy and Engineering

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10.1016/0022-3115(87)90432-6

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title = "A microwave spectrometer to monitor discharge cleaning",

abstract = "A new type of gas monitor using microwave spectroscopy is applied for studying glow discharge cleaning in a toroidal plasma device. The amount of H2O partial pressure during the cleaning procedure is determined by the absoprtion of the microwave power with corresponding rotational spectra of 22.235 GHz for water molecules. By applying this method, it is possible to measure the relatively high gas pressure (up to 100 Pa) encountered during the cleaning. The rate of H2O production and the time history of H2O during the cleaning are monitored and the efficiency of the reduction of H2O is discussed.",

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T1 - A microwave spectrometer to monitor discharge cleaning

AU - Funato, Y.

AU - Kitajima, S.

AU - Watanabe, H.

AU - Mushiaki, M.

AU - Kubota, Y.

AU - Miyahara, A.

PY - 1987/2/2

Y1 - 1987/2/2

N2 - A new type of gas monitor using microwave spectroscopy is applied for studying glow discharge cleaning in a toroidal plasma device. The amount of H2O partial pressure during the cleaning procedure is determined by the absoprtion of the microwave power with corresponding rotational spectra of 22.235 GHz for water molecules. By applying this method, it is possible to measure the relatively high gas pressure (up to 100 Pa) encountered during the cleaning. The rate of H2O production and the time history of H2O during the cleaning are monitored and the efficiency of the reduction of H2O is discussed.

AB - A new type of gas monitor using microwave spectroscopy is applied for studying glow discharge cleaning in a toroidal plasma device. The amount of H2O partial pressure during the cleaning procedure is determined by the absoprtion of the microwave power with corresponding rotational spectra of 22.235 GHz for water molecules. By applying this method, it is possible to measure the relatively high gas pressure (up to 100 Pa) encountered during the cleaning. The rate of H2O production and the time history of H2O during the cleaning are monitored and the efficiency of the reduction of H2O is discussed.

KW - HO monitor

KW - discharge cleaning

KW - microwave spectroscopy

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JO - Journal of Nuclear Materials

JF - Journal of Nuclear Materials

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