A microwave spectrometer to monitor discharge cleaning

Y. Funato, S. Kitajima, H. Watanabe, M. Mushiaki, Y. Kubota, A. Miyahara

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


A new type of gas monitor using microwave spectroscopy is applied for studying glow discharge cleaning in a toroidal plasma device. The amount of H2O partial pressure during the cleaning procedure is determined by the absoprtion of the microwave power with corresponding rotational spectra of 22.235 GHz for water molecules. By applying this method, it is possible to measure the relatively high gas pressure (up to 100 Pa) encountered during the cleaning. The rate of H2O production and the time history of H2O during the cleaning are monitored and the efficiency of the reduction of H2O is discussed.

Original languageEnglish
Pages (from-to)720-722
Number of pages3
JournalJournal of Nuclear Materials
Issue numberC
Publication statusPublished - 1987 Feb 2


  • HO monitor
  • discharge cleaning
  • microwave spectroscopy

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Materials Science(all)
  • Nuclear Energy and Engineering


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