A manufacturable 0.18-μm SiGe BiCMOS technology for 40-Gb/s optical communication LSIs

S. Wada, Y. Nonaka, T. Saito, T. Tominari, K. Koyu, K. Ikeda, K. Sakai, K. Sasahara, K. Watanabe, H. Fujiwara, F. Murata, E. Ohue, Y. Kiyota, H. Shimamoto, K. Washio, R. Takeyari, H. Hosoe, T. Hashimoto

Research output: Contribution to conference › Paper › peer-review