A high sensitivity and compact real time gas concentration sensor for semiconductor and electronic device manufacturing process

Hidekazu Ishii, Masaaki Nagase, Nobukazu Ikeda, Yoshinobu Shiba, Yasuyuki Shirai, Rihito Kuroda, Shigetoshi Sugawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

We have been studying in-line gas concentration sensor units for various metal-organic(MO) gases used in electronic device manufacturing process. MO gases are low vapor pressure and are generally supplied by bubbling. At the time of bubbling supply, concentration control is performed by internal pressure control and feedback control by in-line gas concentration sensor units for concentration correction due to lowering of the liquid level inside the MO tank. We have evaluated a high sensitivity in-line gas concentration sensor that adopts ultraviolet absorption method and charge amplifier detection circuit and demonstrated that it is a unit with high response speed of 400 msec or less and high detection sensitivity. In this report, we confirmed that it is possible to measure the concentration of Zr, Hf type MO gas used for semiconductor gate insulating film.

Original languageEnglish
Title of host publicationECS Transactions
PublisherIOP Publishing Ltd.
Pages1399-1405
Number of pages7
Edition13
ISBN (Electronic)9781510866171, 9781510866171, 9781510866171, 9781607688280, 9781607688303, 9781607688310, 9781607688327, 9781607688334, 9781607688341, 9781607688358, 9781607688365, 9781607688372, 9781607688389, 9781607688396, 9781607688402, 9781607688419
DOIs
Publication statusPublished - 2018
Event233rd Meeting of the Electrochemical Society - Seattle, United States
Duration: 2018 May 132018 May 17

Publication series

NameECS Transactions
Number13
Volume85
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

Conference233rd Meeting of the Electrochemical Society
Country/TerritoryUnited States
CitySeattle
Period18/5/1318/5/17

ASJC Scopus subject areas

  • Engineering(all)

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