A fast evaluation method for pitch deviation and out-of-flatness of a planar scale grating

W. Gao, A. Kimura

Research output: Contribution to journalArticlepeer-review

32 Citations (Scopus)

Abstract

A planar scale grating with a pitch of 1 μm used in an interferential scanning-type planar encoder, which produces multi-axis position signals based on interference between first-order diffracted beams from the grating, is evaluated by a 100 mm-aperture Fizeau interferometer. The out-of-flatness of the grating is first evaluated from the wavefront of the zero-order diffracted beam from the grating. The grating is then tilted to align the axes of the first-order diffracted beams with that of the interferometer so that the X- and Y-directional pitch deviations of the grating can be evaluated from the wavefronts of the first-order diffracted beams.

Original languageEnglish
Pages (from-to)505-508
Number of pages4
JournalCIRP Annals - Manufacturing Technology
Volume59
Issue number1
DOIs
Publication statusPublished - 2010 Apr 6

Keywords

  • Interferometry
  • Measurement
  • Optical

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering

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