A CPU on a glass substrate using CG-silicon TFTs

Buyeol Lee, Yasuhiro Hirayama, Yasushi Kubota, Shigeki Imai, Akihiko Imaya, Mikio Katayama, Kiyoshi Kato, Akira Ishikawa, Takayuki Ikeda, Yoshiyuki Kurokawa, Tadafumi Ozaki, Kohei Mutaguch, Shumpei Yamazaki

Research output: Contribution to journalConference articlepeer-review

31 Citations (Scopus)

Abstract

A CPU is produced on a glass substrate using continuous-gain silicon TFTs. Corning 1737 glass with a distortion point of 640°C forms the glass substrate and the process temperature never exceeds 550°C. The 8b CPU contains 13,000 TFTs and the chip area is 13 × 13mm2. Operation at a frequency of 3MHz was confirmed at 5V.

Original languageEnglish
Pages (from-to)157+164-165
JournalDigest of Technical Papers - IEEE International Solid-State Circuits Conference
DOIs
Publication statusPublished - 2003
Event2003 Digest of Technical Papers - , United States
Duration: 2003 Feb 92003 Feb 13

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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