A comparative study of the mechanical strength of chemical vapor-deposited diamond and physical vapor-deposited hard coatings

S. Kamiya, H. Nagasawa, K. Yamanobe, M. Saka

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)

Abstract

Four mechanical parameters of physical vapor-deposited (PVD) hard coatings were obtained, which were the residual strain, Young's modulus, film toughness, and interface toughness, concerning titanium aluminum nitride (TiAlN) and titanium nitride (TiN) coatings deposited on WC-Co substrates. The results were quantitatively compared with the author's previous trials for the case of chemical vapor-deposited (CVD) diamond coatings. Due to the significant difference in the mechanical properties between PVD hard coatings and CVD diamond coatings, it was necessary to develop new experimental techniques, which could properly evaluate those parameters for the case of PVD hard coatings. As a conclusion, film toughness of PVD hard coatings was surprisingly brittle. It was an order of magnitude smaller than that of CVD diamond coatings. In contrast, no significant difference was found in interface toughness between these different kinds of coatings. Concerning the residual strain, TiN had far larger level than the other two. These differences in mechanical properties were further discussed in relation to the difference in their wear behavior.

Original languageEnglish
Pages (from-to)123-131
Number of pages9
JournalThin Solid Films
Volume473
Issue number1
DOIs
Publication statusPublished - 2005 Feb 1

Keywords

  • Adhesion
  • Chemical vapor deposition (CVD)
  • Mechanical properties
  • Physical vapor deposition (PVD)
  • Toughness

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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