A Comparative Study of the Growth of Cr on (110)TiO2 Rutile, (0001) α-Al2O3 and (100)SrTiO3 Surfaces

T. Wagner, Q. Fu, C. Winde, S. Tsukimoto, F. Phillipp

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    9 Citations (Scopus)

    Abstract

    Thin Cr films were deposited on single crystal α-Al2O 3, SrTiO3 and TiO2 (rutile) substrates under ultrahigh vacuum conditions using molecular beam epitaxy (MBE). The growth behavior and thermal stability of the films were investigated with scanning tunneling microscopy (STM), X-ray phototelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and transmission electron microscopy (TEM). Cr grew as 3D clusters on all substrates. For all three Cr/oxide systems a strong temperature dependent interfacial reaction was observed. The results suggested that these reactions depended greatly on thermodynamics and on transport properties in the oxide substrates.

    Original languageEnglish
    Pages (from-to)117-126
    Number of pages10
    JournalInterface Science
    Volume12
    Issue number1
    DOIs
    Publication statusPublished - 2004 Jan

    Keywords

    • AES
    • Cr
    • MBE
    • Metal-oxide interfaces
    • STM
    • TEM
    • XPS

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Materials Science(all)
    • Condensed Matter Physics

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