An iron core in ferritin and a chlorine (Cl) neutral beam for etching were used for the fabrication of a 7-nm silicon nanocolumn structure. The neutral beam etching (NBE) process was caused by high etching selectivity to the iron-core mask in the process. A high etching selectivity to the iron mask was obtained, whereas in the conventional plasma etching processes, the hydrated iron oxide was affected by the radiation of the high-energy photons and charged particles. The iron core in the ferritin was identical to that of etched nanocolumn which indicates that neutral-beam etching transferred the structure and size of the iron core to the silicon substrate.
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)