A 7-nm nanocolumn structure fabricated by using a ferritin iron-core mask and low-energy Cl neutral beams

Tomohiro Kubota, Tomohiro Baba, Seiji Samukawa, Hiroyuki Kawashima, Yukiharu Uraoka, Takashi Fuyuki, Ichiro Yamashita

Research output: Contribution to journalArticlepeer-review

47 Citations (Scopus)

Abstract

An iron core in ferritin and a chlorine (Cl) neutral beam for etching were used for the fabrication of a 7-nm silicon nanocolumn structure. The neutral beam etching (NBE) process was caused by high etching selectivity to the iron-core mask in the process. A high etching selectivity to the iron mask was obtained, whereas in the conventional plasma etching processes, the hydrated iron oxide was affected by the radiation of the high-energy photons and charged particles. The iron core in the ferritin was identical to that of etched nanocolumn which indicates that neutral-beam etching transferred the structure and size of the iron core to the silicon substrate.

Original languageEnglish
Pages (from-to)1555-1557
Number of pages3
JournalApplied Physics Letters
Volume84
Issue number9
DOIs
Publication statusPublished - 2004 Mar 1

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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