A 2.8 μm pixel-pitch 55- ke full-well capacity global-shutter complementary metal oxide semiconductor image sensor using lateral overflow integration capacitor

Shin Sakai, Yoshiaki Tashiro, Rihito Kuroda, Shigetoshi Sugawa

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

In this paper, a global-shutter complementary metal oxide semiconductor (CMOS) image sensor using lateral overflow integration capacitor (LOFIC) in each pixel without trade-offs between full-well capacity (FWC) and dark current and between FWC and pixel size has been demonstrated. Because the FWC is determined only by LOFIC, a photodiode (PD) and storage diffusion capacitor (SD) are designed focusing on achieving low dark current performance especially. A 2.8 m pixel pitch Bayer-RGB color CMOS image sensor with the pinned diffusion capacitor for the storage node was fabricated and achieved both 83.3 e/s at the PD and 58.3 e/s at the SD dark current at 60 C and about 55 ke full well capacity. A high resolution performance, a high FWC performance and a low dark current performance were simultaneously achieved in this image sensor.

Original languageEnglish
Article number04CE01
JournalJapanese journal of applied physics
Volume52
Issue number4 PART 2
DOIs
Publication statusPublished - 2013 Apr 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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