A 120-ke full-well capacity 160-µV/e conversion gain 2.8-µm backside-illuminated pixel with a lateral overflow integration capacitor

Isao Takayanagi, Ken Miyauchi, Shunsuke Okura, Kazuya Mori, Junichi Nakamura, Shigetoshi Sugawa

Research output: Contribution to journalArticle

Abstract

In this paper, a prototype complementary metal-oxide-semiconductor (CMOS) image sensor with a 2.8-µm backside-illuminated (BSI) pixel with a lateral overflow integration capacitor (LOFIC) architecture is presented. The pixel was capable of a high conversion gain readout with 160 µV/e for low light signals while a large full-well capacity of 120 ke was obtained for high light signals. The combination of LOFIC and the BSI technology allowed for high optical performance without degradation caused by extra devices for the LOFIC structure. The sensor realized a 70% peak quantum efficiency with a normal (no anti-reflection coating) cover glass and a 91% angular response at ±20 incident light. This 2.8-µm pixel is potentially capable of higher than 100 dB dynamic range imaging in a pure single exposure operation.

Original languageEnglish
Article number5572
JournalSensors (Switzerland)
Volume19
Issue number24
DOIs
Publication statusPublished - 2019 Dec 2

Keywords

  • Backside illumination
  • CMOS image sensor
  • High full-well capacity
  • High sensitivity
  • Lateral overflow integration capacitor
  • Single exposure
  • Wide dynamic range

ASJC Scopus subject areas

  • Analytical Chemistry
  • Biochemistry
  • Atomic and Molecular Physics, and Optics
  • Instrumentation
  • Electrical and Electronic Engineering

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