30 nm-scale-fabrication of magnetic tunnel junctions using electron beam assisted CVD hard masks

S. Isogami, M. Tsunoda, Migaku Takahashi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationINTERMAG ASIA 2005
Subtitle of host publicationDigests of the IEEE International Magnetics Conference
Number of pages1
Publication statusPublished - 2005 Dec 12
EventINTERMAG ASIA 2005: Digests of the IEEE International Magnetics Conference - Nagoya, Japan
Duration: 2005 Apr 42005 Apr 8

Publication series

NameINTERMAG ASIA 2005: Digests of the IEEE International Magnetics Conference

Other

OtherINTERMAG ASIA 2005: Digests of the IEEE International Magnetics Conference
CountryJapan
CityNagoya
Period05/4/405/4/8

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Isogami, S., Tsunoda, M., & Takahashi, M. (2005). 30 nm-scale-fabrication of magnetic tunnel junctions using electron beam assisted CVD hard masks. In INTERMAG ASIA 2005: Digests of the IEEE International Magnetics Conference [FW 08] (INTERMAG ASIA 2005: Digests of the IEEE International Magnetics Conference).