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0.8 μm BiCMOS process with high resistivity substrate for L-band Si-MMIC applications
Takashi Nakashima, Shunji Kubo, Yoshitaka Otsu, Tatsuhiko Ikeda, Noriharu Suematsu, Masao Yamawaki, Tadashi Hirao
Research output: Contribution to conference › Paper › peer-review
9
Citations
(Scopus)