0.8 μm BiCMOS process with high resistivity substrate for L-band Si-MMIC applications

Takashi Nakashima, Shunji Kubo, Yoshitaka Otsu, Tatsuhiko Ikeda, Noriharu Suematsu, Masao Yamawaki, Tadashi Hirao

Research output: Contribution to conferencePaperpeer-review

9 Citations (Scopus)

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Engineering & Materials Science