(0 0 6)-oriented α-Al₂O₃ films prepared in CO₂-H₂ atmosphere by laser chemical vapor deposition using a diode laser

Engineering & Materials Science

• Semiconductor lasers 100%
• Chemical vapor deposition 93%
• Aluminum oxide 77%
• Lasers 61%
• Deposition rates 17%
• Crystals 13%
• Textures 10%
• Aluminum 10%
• Microstructure 9%
• Temperature 5%

Physics & Astronomy

• vapor deposition 61%
• atmospheres 56%
• lasers 35%
• textures 11%
• grain size 10%
• aluminum 9%
• coefficients 7%
• crystals 6%

Chemical Compounds

• Chemical Vapour Deposition 72%
• Acetylacetonate 14%
• Crystalline Texture 13%
• Grain Size 12%
• Microstructure 9%
• Mixture 5%