Engineering & Materials Science
Plasmas
Thin film transistors
Magnetron sputtering
Sputtering
Annealing
Plasma sources
Microwaves
Yttrium
Doping (additives)
Excimer lasers
Etching
Magnets
Electric properties
Silicides
Substrates
Ion bombardment
Thin films
Silicon
Amorphous films
Polysilicon
Plasma density
Gases
Lasers
Oxides
Oxygen
Temperature
Flow of gases
Electron temperature
Ferroelectric materials
Metals
Crystallinity
Nitrogen
Magnetic mirrors
Permittivity
Silicon nitride
Carrier concentration
Electron cyclotron resonance
Ions
Ferroelectric thin films
Plasma etching
Fabrication
Ion implantation
Inert gases
Fluorocarbons
Transistors
Telegraph
Plasma applications
Zinc oxide
Sol-gels
Electrons
Chemical Compounds
Thin film transistors
Plasmas
Doping (additives)
Excimer lasers
Sputtering
Polysilicon
pentacene
Magnetron sputtering
fluorine monoxide
Annealing
Magnets
Lasers
Thin films
Plasma sources
silicon nitride
Yttrium
Gases
Substrates
Ion implantation
Ion bombardment
Magnetic mirrors
Etching
Fabrication
Plasma density
Oxides
Microwaves
Carrier concentration
Silicon
Electron cyclotron resonance
Nitrogen
Ions
Organic field effect transistors
Flow of gases
Temperature
phosphoric acid
Electron temperature
Coatings
Electric properties
Ferroelectric thin films
Plasma etching
Chemical activation
Amorphous films
Laser beam effects
Lighting
Erosion
Partial pressure
Noble Gases
Elastomers
O rings
Silicides
Physics & Astronomy
transistors
microwaves
yttrium
chambers
thin films
showers
magnetron sputtering
etching
gases
silicides
excimer lasers
gas flow
plasma density
damage
electrical properties
sputtering
gas injection
oxyfluorides
electric contacts
wafers
permittivity
plasma etching
fluorocarbons
bombardment
CMOS
laser annealing
ions
flattening
flow distribution
silicon
phosphoric acid
metal oxides
electron energy
field effect transistors
high speed
oxygen
electrical resistivity
magnets
speed control
random access memory
zinc oxides
fabrication
performance
gas pressure
ceramics
oxide films
silicon transistors
floating
activation
rare gases